2019-01-16 Welcome guest,  Sign In  |  Sign Up
Chin. Opt. Lett.
 Home  List of Issues    Issue 03 , Vol. 16 , 2018    10.3788/COL201816.032201

Useful way to compensate for intrinsic birefringence caused by calcium fluoride in optical lithography systems
Zelong Zhou1;2, Hongbo Shang1, Yongxin Sui1, and Huaijiang Yang1
1 Engineering Researcher Center of Extreme Precision Optics, [Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences], Changchun 1 30033, China
2 [University of Chinese Academy of Sciences], Beijing 100049, China

Chin. Opt. Lett., 2018, 16(03): pp.032201

Topic:Optical design and fabrication
Keywords(OCIS Code): 220.3740  260.1440  260.5430  

Calcium fluoride is widely used in optical lithography lenses and causes retardation that cannot be ignored. However, few studies have been conducted to compensate for the retardation caused by calcium fluoride in optical lithography systems. In this Letter, a new index based on orientation Zernike polynomials is established to describe the value of retardation. Then, a method of retardation compensation is described. The method is implemented by clocking calcium fluoride lens elements, and the optimal rotation angles are calculated using a population-based stochastic optimization algorithm. Finally, an example is provided to validate the method.

Copyright: © 2003-2012 . This is an open-access article distributed under the terms of the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.

 View PDF (513 KB)


Posted online:2018/3/6

Get Citation: Zelong Zhou, Hongbo Shang, Yongxin Sui, and Huaijiang Yang, "Useful way to compensate for intrinsic birefringence caused by calcium fluoride in optical lithography systems," Chin. Opt. Lett. 16(03), 032201(2018)



1. J. H. Burnett, Z. H. Levine, E. L. Shirley, and J. H. Bruning, J. Micro/Nanolithogr. MEMS MOEMS 1, 213 (2002).

2. B. Geh, J. Ruoff, J. Zimmermann, P. Gr?upner, M. Totzeck, M. Mengel, U. Hempelmann, and E. Schmitt-Weaver, Proc. SPIE 6520, 65200F (2007).

3. J. Ruoff, and M. Totzeck, Proc. SPIE 7652, 76521T (2010).

4. A. Serebriakov, F. Bociort, and J. Braat, Proc. SPIE 5754, 1780 (2005).

5. R. C. Jones, J. Opt. Soc. Am. 31, 488 (1941).

6. J. Ruoff, and M. Totzeck, J. Micro/Nanolithogr. MEMS MOEMS 8, 031404 (2009).

7. J. Kennedy, and R. Eberhart, in Proceedings of IEEE International Conference on Neural Networks , Perth, Australia (1995), p.?1942.

8. Y. Omura, “Projection exposure methods and apparatus, and projection optical systems,” U.S. patent 6,864,961 (March?8, 2005).

9. J. H. Burnett, Z. H. Levine, and E. L. Shirley, Phys. Rev. B 64, 241102 (2001).

Save this article's abstract as
Copyright©2018 Chinese Optics Letters 沪ICP备15018463号-7 公安备案沪公网安备 31011402005522号