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Chin. Opt. Lett.
 Home  List of Issues    Issue 06 , Vol. 15 , 2017    10.3788/COL201715.062201


Versatile nanosphere lithography technique combining multiple-exposure nanosphere lens lithography and nanosphere template lithography
Yonghui Zhang1;2, Zihui Zhang1;2, Chong Geng1;2, Shu Xu1;2, Tongbo Wei3, and Wen'gang Bi1;2
1 Institute of Micro-Nano Photoelectron and Electromagnetic Technology Innovation, School of Electronics and Information Engineering, [Hebei University of Technology], Tianjin 300401 , China
2 [Key Laboratory of Electronic Materials and Devices of Tianjin], Tianjin 300401, China
3 Semiconductor Lighting Technology Research and Development Center, [Institute of Semiconductors], Chinese Academy of Sciences, Beijing 100083 , China

Chin. Opt. Lett., 2017, 15(06): pp.062201

DOI:10.3788/COL201715.062201
Topic:Optical design and fabrication
Keywords(OCIS Code): 220.4241  110.4235  

Abstract
A versatile nanosphere composite lithography (NSCL) combining both the advantages of multiple-exposure nanosphere lens lithography (MENSLL) and nanosphere template lithography (NSTL) is demonstrated. By well controlling the development, washing and the drying processes, the nanosphere monolayer can be well retained on the substrate after developing and washing. Thus the NSTL can be performed based on MENSLL to fabricate nanoring, nanocrescent and hierarchical multiple structures. The pattern size and the shape can be systemically tuned by shrinking nanospheres by using dry etching and adjusting the tilted angle. It is a natural nanopattern alignment process and possesses a great potential in the scope of nano-science due to its low cost, simplicity, and versatility for variuos nano-fabrications.

Copyright: © 2003-2012 . This is an open-access article distributed under the terms of the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.

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Received:2017/1/23
Accepted:2017/2/17
Posted online:2017/3/15

Get Citation: Yonghui Zhang, Zihui Zhang, Chong Geng, Shu Xu, Tongbo Wei, and Wen'gang Bi, "Versatile nanosphere lithography technique combining multiple-exposure nanosphere lens lithography and nanosphere template lithography," Chin. Opt. Lett. 15(06), 062201(2017)

Note: This work was supported by the National Natural Science Foundation of China (Nos. 61604051, 51502074 and 61474109), the Natural Science of Foundation of Tianjin (Nos. 16JCQNJC01000 and 16JCYBJC16200), the Technology Foundation for Selected Overseas Chinese Scholar by Ministry of Human Resources and Social Security of the People’s Republic of China (No. CG2016008001), and the Research Award for Top Young Scientist of Excellence of Hebei Province (No. 210013).



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