2018-10-20 Welcome guest,  Sign In  |  Sign Up
Chin. Opt. Lett.
 Home  List of Issues    Issue s1 , Vol. 11 , 2013    10.3788/COL201311.S10606


Multilayers with high-reflectivity at 19.5 nm and low-reflectivity at 30.4 nm
Li Jiang1, Jingtao Zhu1, Zhong Zhang1, Zhanshan Wang1, Michael Trubetskov2, Alexander V. Tikhonravov2
1 Department Institute of Precision Optical Engineering, Department of Physics, [Tongji University], Shanghai 200092, China
2 [Lomonosov Moscow State University], Russia

Chin. Opt. Lett., 2013, 11(s1): pp.S10606

DOI:10.3788/COL201311.S10606
Topic:Duv/euv coatings
Keywords(OCIS Code): 240.0310  310.4165  

Abstract
The multilayer (ML) mirror with high-reflectivity (HR) at a specific emission line of 19.5 nm (Fe line) and low-reflectivity (LR) at 30.4 nm (He line) is needed to be designed and fabricated for observing the image of sun. Based on a variety of optimizations utilized different structures, the design is performed and the final results demonstrate that the reflectivity at 30.4 nm does not achieve minimum value when the reflectivity at 19.5 nm reaches the maximum value. The tradeoff should be done between the HR at 19.5 nm and LR at 30.4 nm. One optimized mirror is fabricated by direct current magnetron sputtering and characterized by grazing-incident X-ray diffraction (XRD) and synchrotron radiation (SR). The experimental results demonstrate that the ML achieves the reflectivity of 33.3% at 19.5 nm and of 9.6 \times 10-4 at 30.4 nm at the incident angle of 13.

Copyright: © 2003-2012 . This is an open-access article distributed under the terms of the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.

 View PDF (261 KB)

Share:


Received:2012/12/6
Accepted:2012/12/26
Posted online:2013/6/7

Get Citation: Li Jiang, Jingtao Zhu, Zhong Zhang, Zhanshan Wang, Michael Trubetskov, Alexander V. Tikhonravov, "Multilayers with high-reflectivity at 19.5 nm and low-reflectivity at 30.4 nm," Chin. Opt. Lett. 11(s1), S10606(2013)

Note: This work was supported by the National Natural Science Foundation of China under Grant No. 11027507.



References

1. J. P. Delaboudiniere, G. E. Artzner, J. Brunaud, A. H. Gabriel, J. F. Hochedez, and F. Millier, Sol. Phys. 162, 291 (1995).

2. V. Slemzin, S. Kuzin, I. Zhitnik, J. P. Delaboudiniere, F. Auchere, A. Zhukov, R. Linden, O. Bugaenko, A. Ignat’ev, A. Mitrofanov, A. Pertsov, S. Oparin, A. Stepanov, and A. Afanas’ev, Sol. Sys. Res. 39, 489 (2005)

3. A. K. Dupree, Astrophys. J. 178, 527 (1996).

4. T. Yoshida and S. Tsuneta, Astrophys. J. 459, 342 (1996).

5. M. F. Ravet, F. Bridou, X. Zhang-Song, A. Jerome, F. Delmotte, R. Mercier, M. Bougnet, P. Bouyries, and J. P. Delaboudiniere, Proc. SPIE 5250, 99 (2004).

6. A. J. Corso, P. Zuppella, P. Nicolosi, D. L. Windt, E. Gullikson, and M. G. Pelizzo, Opt. Express 19, 13963 (2011).

7. E. Meltchakov, C. Hecquet, M. Roulliay, S. D. Rossi, Y. Menesguen, A. Jerome, F. Bridou, F. Varniere, M. F. Ravet-Krill, and F. Delmottel, Appl. Phys. A 98, 111 (2010).

8. D. L. Voronov, E. H. Anderson, R. Cambie, S. Cabrini, S. D. Dhuey, L. I. Goray, E. M. Gullikson, F. Salmassi, T. Warwick, V. V. Yashchuk, and H. A. Padmore, Opt. Express 19, 6320 (2011).

9. E. Meltchakov, C. Hecquet, M. Roulliay, S. D. Rossi, Y. Menesguen, A. Jerome, F. Bridou, F. Varniere, M. F. Ravet-Krill, and F. Delmottel, Appl. Phys. A 98, 111 (2010).

10. J. H. Underwood and T. W. Barbee, Appl. Opt. 20, 3027 (1981).

11. A. Khandar and P. Dhez, Proc. SPIE 563, 158 (1985).

12. B. W. Smith, J. J. Bloch, and D. R. Dupre, Proc. SPIE 1160, 171 (1989).

13. N. M. Celgio, J. X-ray Sci. Technol. 1, 7 (1989).

14. Z.Wang, F.Wang, Z. Zhang, H.Wang, W.Wu, S. Zhang, Y. Xu, Z. Gu, X. Cheng, C. Li, Y. Wu, B. Wang, S. Qin, and L. Chen, Opt. Prec. Eng. (in Chinese) 13, 512 (2005).

15. D. D. Allred, R. S. Turley, and M. B. Squires, Proc. SPIE 3767, 280 (1999).

16. S. Lunt, R. S. Turley, and D. D. Allred, J. X-ray Sci. Technol. 9, 1 (2001).

17. Z. S. Wang, J. T. Zhu, R. Chen, J. Xu, F. L. Wang, Z. Zhang, J. Xu, W. J. Wu, L. Q. Liu, H. J. Zhang, D. Xu, H. Jiang, L. Y. Chen, H. J. Zhou, T. L. Huo, M. Q. Cui, and Y. D. Zhao, Proc. SPIE 6984, 698433 (2008).

18. Z. S. Wang, Proc. SPIE 7101, 710110 (2008).

19. C. Hecquet, F. Delmotte, M. F. Ravet-Krill, S. Rossi, A. Jerome, F. Bridou, F. Varniere, E. Meltchakov, F. Auchere, A. Giglia, N. Mahne, and S. Nanaronne, Appl. Phys. A95, 401 (2009).

20. J. Gautier, F. Delmotte, and M. F. Ravet, Opt. Commun. 281, 3032 (2008).

21. S. Zuccon, D. Garoli, M. G. Pelizzo, P. Nicolosi, S. Fineschi, and D. Windt, in Proceedings of 6th International Conference on Space Optics (2006).

22. M. Suman, M. G. Pelizzo, D. L. Windt, and P. Nicolosi, Appl. Opt. 48, 5432 (2009).

23. M. Zhou and S. Sun, Genetic Algorithms: Theory and Applications (in Chinese) (National Defence Industry, Beijing, 2005).

24. J. T. Zhu, Z. S. Wang, Z. Zhang, and F. Wang, Appl. Opt. 47, 310 (2008).

25. S. Xue and J. Shao, Opt. Prec. Eng. (in Chinese) 12, 480 (2004).


Save this article's abstract as
Copyright©2018 Chinese Optics Letters 沪ICP备05015387