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Chin. Opt. Lett.
 Home  List of Issues    Issue 09 , Vol. 11 , 2013    10.3788/COL201311.090802


Glass homogeneity effect on wavefront aberration in lithography projection lens
Hongbo Shang, Wei Huang, Chunlai Liu, Weicai Xu, Wang Yang
State Key Laboratory of Applied Optics, [Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences], Changchun 130033, China

Chin. Opt. Lett., 2013, 11(09): pp.090802

DOI:10.3788/COL201311.090802
Topic:Geometric optics
Keywords(OCIS Code): 080.3095  220.3740  220.1000  

Abstract
Analysis of glass homogeneity using the attaching interferometric data model neglects body distribution. To improve analysis accuracy, we establish the three-dimensional gradient index (GRIN) model of glass index by analyzing fused silica homogeneity distribution in two perpendicular measurement directions. Using the GRIN model, a lithography projection lens with a numerical aperture of 0.75 is analyzed. Root mean square wavefront aberration deteriorates from 0.9 to 9.65 nm and then improves to 5.9 nm after clocking.

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Received:2013/4/29
Accepted:2013/8/2
Posted online:2013/9/3

Get Citation: Hongbo Shang, Wei Huang, Chunlai Liu, Weicai Xu, Wang Yang, "Glass homogeneity effect on wavefront aberration in lithography projection lens," Chin. Opt. Lett. 11(09), 090802(2013)

Note: This work was supported by the Major National Science and Technology Project of China (No. 2009ZX02205).



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