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Chin. Opt. Lett.
 Home  List of Issues    Issue 11 , Vol. 02 , 2004    Design of LICVD equipment for preparation of nano powder and study on laser threshold


Design of LICVD equipment for preparation of nano powder and study on laser threshold
Yingcai Liu1, Yansheng Yin1, Jing Li2, Gui Wang2
1Institute of Material Science and Engineering, Ocean University of China, Qingdao 2660032Key Lab for Liquid Structure and Heredity of Ministry of Education, Engineering Ceramics Key Lab of Shandong Province, Shandong University, Ji'nan 250061

Chin. Opt. Lett., 2004, 02(11): pp.643-643-

DOI:
Topic:Integrated optics
Keywords(OCIS Code): 140.3450  040.6040  130.3120  310.1860  

Abstract
A laser-induced chemical vapor deposition (LICVD) nanometer equipment is designed and fabricated. The design conception of key parts is expatiated. The energy threshold of SiH4 decomposing is studied. In the condition of same reactive gas flux, the laser energy threshold decreases with the increase of SiH4 concentration. In the condition of same SiH4 concentration, with the increase of reactive gas flux, the laser energy threshold which induces SiH4 decomposition increases linearly at the beginning, and when the flux is more than 100 ml/min, it turns to increase slowly. The factors which influence the laser threshold are analyzed.

Copyright: © 2003-2012 . This is an open-access article distributed under the terms of the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.

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Received:2004/5/27
Accepted:
Posted online:

Get Citation: Yingcai Liu, Yansheng Yin, Jing Li, Gui Wang, "Design of LICVD equipment for preparation of nano powder and study on laser threshold," Chin. Opt. Lett. 02(11), 643-643-(2004)

Note: This work was supported by the National Natural Scicence Foundation of China under Grant No. 50242008. Y. Liu's e-mail address is lyc2004@ouc.edu.cn.



References

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2. H. Y. Zhang, A. X. Wei, S. H. Liu, W. Wang, D. Chen, L. Liang, and K. Chen, Thin Solid Films368, 315 (2000).

3. S. Veprek, F.-A. Sarott, and Z. Iqbal, Phys. Rev. B36, 3344 (1987).


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